JPH0637521Y2 - マイクロ波励起による紫外線発生装置 - Google Patents
マイクロ波励起による紫外線発生装置Info
- Publication number
- JPH0637521Y2 JPH0637521Y2 JP1988130728U JP13072888U JPH0637521Y2 JP H0637521 Y2 JPH0637521 Y2 JP H0637521Y2 JP 1988130728 U JP1988130728 U JP 1988130728U JP 13072888 U JP13072888 U JP 13072888U JP H0637521 Y2 JPH0637521 Y2 JP H0637521Y2
- Authority
- JP
- Japan
- Prior art keywords
- microwave
- ultraviolet
- reflector
- cavity
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005284 excitation Effects 0.000 title claims description 3
- 239000000758 substrate Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988130728U JPH0637521Y2 (ja) | 1988-10-05 | 1988-10-05 | マイクロ波励起による紫外線発生装置 |
US07/416,309 US4990789A (en) | 1988-05-10 | 1989-10-03 | Ultra violet rays generator by means of microwave excitation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988130728U JPH0637521Y2 (ja) | 1988-10-05 | 1988-10-05 | マイクロ波励起による紫外線発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0250906U JPH0250906U (en]) | 1990-04-10 |
JPH0637521Y2 true JPH0637521Y2 (ja) | 1994-09-28 |
Family
ID=15041212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988130728U Expired - Fee Related JPH0637521Y2 (ja) | 1988-05-10 | 1988-10-05 | マイクロ波励起による紫外線発生装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4990789A (en]) |
JP (1) | JPH0637521Y2 (en]) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5057751A (en) * | 1990-07-16 | 1991-10-15 | General Electric Company | Protective coating for high-intensity metal halide discharge lamps |
US5166528A (en) * | 1991-10-04 | 1992-11-24 | Le Vay Thurston C | Microwave-actuated ultraviolet sterilizer |
US5471109A (en) * | 1992-12-31 | 1995-11-28 | Fusion Systems Corporation | Method and apparatus for preventing reverse flow in air or gas cooled lamps |
US5373217A (en) * | 1993-03-24 | 1994-12-13 | Osram Sylvania Inc. | Method and circuit for enhancing stability during dimming of electrodeless hid lamp |
US5959306A (en) * | 1996-02-08 | 1999-09-28 | Bright Solutions, Inc. | Portable light source and system for use in leak detection |
EP0983522A4 (en) * | 1996-11-05 | 2000-03-08 | Corrosion Consultants Inc | ULTRAVIOLET LIGHTING LIGHTING AND VIEWING SYSTEM AND METHOD FOR DETECTING LEAKS OF FLUORESCENT DYE |
US6133577A (en) * | 1997-02-04 | 2000-10-17 | Advanced Energy Systems, Inc. | Method and apparatus for producing extreme ultra-violet light for use in photolithography |
US6065203A (en) * | 1998-04-03 | 2000-05-23 | Advanced Energy Systems, Inc. | Method of manufacturing very small diameter deep passages |
US6194733B1 (en) | 1998-04-03 | 2001-02-27 | Advanced Energy Systems, Inc. | Method and apparatus for adjustably supporting a light source for use in photolithography |
US6105885A (en) | 1998-04-03 | 2000-08-22 | Advanced Energy Systems, Inc. | Fluid nozzle system and method in an emitted energy system for photolithography |
US6180952B1 (en) | 1998-04-03 | 2001-01-30 | Advanced Energy Systems, Inc. | Holder assembly system and method in an emitted energy system for photolithography |
US6118130A (en) * | 1998-11-18 | 2000-09-12 | Fusion Uv Systems, Inc. | Extendable focal length lamp |
WO2000070651A1 (en) * | 1999-05-12 | 2000-11-23 | Fusion Lighting, Inc. | High brightness microwave lamp |
AU7489500A (en) | 1999-09-20 | 2001-04-24 | Nordson Corporation | Apparatus and method for generating ultraviolet radiation |
US6419749B1 (en) | 1999-11-05 | 2002-07-16 | Fusion Uv Systems, Inc. | Apparatus for UV curing a coating on a filament or the like and method of manufacturing |
CN1224074C (zh) | 2000-04-07 | 2005-10-19 | 诺德森公司 | 带有灯体冷却系统的微波激励的紫外线灯系统 |
US6663297B1 (en) | 2000-07-27 | 2003-12-16 | Quantum Group Inc. | Photon welding optical fiber with ultra violet (UV) and visible source |
US6323601B1 (en) | 2000-09-11 | 2001-11-27 | Nordson Corporation | Reflector for an ultraviolet lamp system |
US6559460B1 (en) | 2000-10-31 | 2003-05-06 | Nordson Corporation | Ultraviolet lamp system and methods |
JP3846203B2 (ja) * | 2001-02-23 | 2006-11-15 | 松下電工株式会社 | 無電極放電灯点灯装置 |
US6505948B2 (en) * | 2001-03-28 | 2003-01-14 | Fusion Uv Systems, Inc. | Method of modifying the spectral distribution of high-intensity ultraviolet lamps |
GB2375603B (en) * | 2001-05-17 | 2005-08-10 | Jenact Ltd | Control system for microwave powered ultraviolet light sources |
KR100414091B1 (ko) * | 2001-07-20 | 2004-01-07 | 엘지전자 주식회사 | 마이크로파를 이용한 조명시스템 |
KR100414090B1 (ko) * | 2001-07-20 | 2004-01-07 | 엘지전자 주식회사 | 마이크로파를 이용한 조명시스템 |
GB0120993D0 (en) * | 2001-08-30 | 2001-10-24 | Quay Technologies | Pulsed UV light source |
US6779350B2 (en) * | 2002-03-21 | 2004-08-24 | Ritchie Enginerring Company, Inc. | Compressor head, internal discriminator, external discriminator, manifold design for refrigerant recovery apparatus and vacuum sensor |
US6832491B2 (en) * | 2002-03-21 | 2004-12-21 | Ritchie Engineering Company, Inc. | Compressor head, internal discriminator, external discriminator, manifold design for refrigerant recovery apparatus |
US6831419B1 (en) * | 2003-06-02 | 2004-12-14 | Nordson Corporation | Exhaust system for a microwave excited ultraviolet lamp |
JP4694803B2 (ja) * | 2003-08-28 | 2011-06-08 | 芝浦メカトロニクス株式会社 | 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法 |
US20050126200A1 (en) * | 2003-12-05 | 2005-06-16 | Ajit Ramachandran | Single valve manifold |
KR20050089516A (ko) * | 2004-03-05 | 2005-09-08 | 학교법인 성균관대학 | 전자석이 구비된 반도체 식각용 중성빔 소오스 |
US20060228242A1 (en) * | 2005-04-11 | 2006-10-12 | Ritchie Engineering Company, Inc. | Vacuum pump |
US20060228246A1 (en) * | 2005-04-11 | 2006-10-12 | Ritchie Engineering Company, Inc. | Vacuum pump |
US20100194265A1 (en) * | 2007-07-09 | 2010-08-05 | Katholieke Universiteit Leuven | Light-emitting materials for electroluminescent devices |
US8179046B2 (en) * | 2008-05-20 | 2012-05-15 | Nordson Corporation | Ultraviolet lamp system with cooling air filter |
JP2011175748A (ja) * | 2010-02-23 | 2011-09-08 | Seiko Epson Corp | 光源装置および投射型表示装置 |
US8269190B2 (en) | 2010-09-10 | 2012-09-18 | Severn Trent Water Purification, Inc. | Method and system for achieving optimal UV water disinfection |
CN104141914B (zh) * | 2013-05-09 | 2016-09-07 | 深圳市海洋王照明工程有限公司 | 蓬顶灯 |
DE102013011066A1 (de) * | 2013-07-03 | 2015-01-08 | Oerlikon Trading Ag, Trübbach | Wärme-Lichttrennung für eine UV-Strahlungsquelle |
TWI785519B (zh) * | 2021-03-05 | 2022-12-01 | 台灣積體電路製造股份有限公司 | 微波產生器、紫外光源、與基板處理方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3136890A (en) * | 1961-07-12 | 1964-06-09 | Harry C Wain | Broad spectrum prospector |
US3911318A (en) * | 1972-03-29 | 1975-10-07 | Fusion Systems Corp | Method and apparatus for generating electromagnetic radiation |
US3872349A (en) * | 1973-03-29 | 1975-03-18 | Fusion Systems Corp | Apparatus and method for generating radiation |
AT355200B (de) * | 1978-01-23 | 1980-02-25 | Espe Pharm Praep | Bestrahlungsgeraet zum aushaerten von durch strahlung haertbaren massen |
US4359668A (en) * | 1979-03-14 | 1982-11-16 | Fusion Systems Corporation | Method and apparatus for igniting electrodeless discharge lamp |
DE3125267A1 (de) * | 1981-06-26 | 1983-01-13 | Patra Patent Treuhand | Halogenellipsoidreflektorlampe mit kaltlichtreflektor |
US4532427A (en) * | 1982-03-29 | 1985-07-30 | Fusion Systems Corp. | Method and apparatus for performing deep UV photolithography |
JPS61104560A (ja) * | 1984-10-25 | 1986-05-22 | Toshiba Corp | マイクロ波放電光源装置 |
US4641033A (en) * | 1984-12-19 | 1987-02-03 | Fusion Systems Corporation | Apparatus and method preventing radiation induced degradation of optical elements |
JPH0426660Y2 (en]) * | 1985-08-05 | 1992-06-26 | ||
JPS62127834A (ja) * | 1985-11-29 | 1987-06-10 | Canon Inc | 照明装置 |
US4710638A (en) * | 1986-02-10 | 1987-12-01 | Fusion Systems Corporation | Apparatus for treating coatings |
JPH0411330Y2 (en]) * | 1986-09-19 | 1992-03-19 | ||
JPH0621167Y2 (ja) * | 1987-08-07 | 1994-06-01 | 高橋 柾弘 | マイクロ波励起による紫外線発生装置 |
-
1988
- 1988-10-05 JP JP1988130728U patent/JPH0637521Y2/ja not_active Expired - Fee Related
-
1989
- 1989-10-03 US US07/416,309 patent/US4990789A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4990789A (en) | 1991-02-05 |
JPH0250906U (en]) | 1990-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |